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- Accession Number
- WOS:000302211800069
- Authors
- R. Rodríguez, X. Aymerich, M. Nafría, M. Porti, A. Crespo-Yepes, and J. Martín-Martínez
- Citation Key
- 355
- COinS Data
- DOI
- 10.1149/2.012206jes
- ISSN
- 0013-4651
- Issue
- 5
- Keywords
- conduction, High-K dielectrics, oxide, reliability, Silicon, SiO2-films
- Issue
- 5
- Pagination
- H529-H535
- Publication Language
- English
- Publisher
- ELECTROCHEMICAL SOC INC, 65 SOUTH MAIN STREET, PENNINGTON, NJ 08534 USA
- Journal
- journal of the Electrochemical Society
- Start Page
- H529
- URL
- http://apps.webofknowledge.com/full_record.do?product=UA&search_mode=GeneralSearch&qid=1&SID=Q2ethSZrxXonm2Oqivg&page=1&doc=4
- Volume
- 159
- Year of Publication
- 2012