Authors
G. Bersuker, M. Nafría, M. Porti, V. Iglesias, A. Shluger, K. McKenna, L. Larcher, A. Padovani, L. Vandelli, P. Kirsch, D. Veksler, and D. C. Gilmer
Citation Key
375
COinS Data

Date Published
Dicember 2011
DOI
10.1063/1.3671565
ISSN
0021-8979
Keywords
AFM, Atomic force microscopy, electric Breakdown, electrical resistivity, grain boundary segregation, Hafnium compounds, leakage currents, oxidation, phonon-phonon interactions, random-acces storage, reliability, stress, titanium compounds, tunnelling, va
Issue
12
Pagination
124518 - 124518-12
Journal
Journal of Applied Physics
Start Page
124518
URL
http://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6119174&sortType%3Ddesc_p_Publication_Year%26pageNumber%3D2%26queryText%3DV.+Iglesias
Volume
110
Year of Publication
2011