Authors
V. Iglesias, A. Cordes, G. Bersuker, N. Domingo, E. Miranda, M. Nafría, S. Claramunt, Q. Wu, C. Couso, and M. Porti
Citation Key
392
COinS Data

Date Published
April 2015
DOI
10.1109/IRPS.2015.7112788
ISBN Number
15180560
Keywords
CAFM, conductive atomic force microscopy, device electrical characteristics, electrical conduction analysis, high mobility substrates, III-V semiconductors, lattice mismatch, PF emission process, Poole-Frenkel emission process, post-electrically stressed
Conference Location
Monterey, CA
Publisher
IEEE
Conference Name
International Reliability Physics Symposium (IRPS)
URL
http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7112788&queryText=nafria&sortType=desc_p_Publication_Year&searchField=Search_All
Year of Publication
2015