Authors X. Blasco, W. Vandervorst, X. Aymerich, i M. Nafría Citation Key 220 COinS Data Date Published 2005 Issue 12 Pagination 719-721 Journal Electronic Letters Volume 41 Year of Publication 2005 ← Charge trapping and degradation of HfO2/SiO2 MOS gate stacks observed with Enhanced CAFM → Electrical characterization of high-dielectric-constant/SiO2 metal-oxide-semiconductor gate stacks by a conductive atomic force microscope