Authors X. Blasco, X. Aymerich, i M. Nafría Citation Key 237 COinS Data Date Published 2003 Pagination 732-736 Journal Surface Science Volume 532-535 Year of Publication 2003 ← A new approach to the modelling of oxide breakdown on CMOS circuits → Atomic Force Microscope topographical artifacts after the dielectric breakdown of ultrathin SiO2 films