Authors X. Blasco, X. Aymerich, M. Nafría, M. Porti, i D. Hill Citation Key 251 COinS Data Date Published 2001 Pagination 110-112 Journal Nanotechnology Volume 12 Year of Publication 2001 ← Influence of a low field with opposite polarity to the stress on the degradation of 4.5nm thick SiO2 films → Characterising the surface roughness of AFM grown SiO2 on Si