Authors M. Nafría, X. Aymerich, D. Yélamos, i J. Suñé Citation Key 280 COinS Data Date Published 1995 Issue 3 Pagination 539-553 Journal Microelectronics and Reliability Volume 35 Year of Publication 1995 ← Degradation and breakdown of thin silicon dioxide films under dynamic electrical stress → Frequency dependence of degradation and breakdown of thin SiO2 films