Accession Number
WOS:000302211800069
Authors
R. Rodríguez, X. Aymerich, M. Nafría, M. Porti, A. Crespo-Yepes, i J. Martín-Martínez
Citation Key
355
COinS Data

DOI
10.1149/2.012206jes
ISSN
0013-4651
Issue
5
Keywords
conduction, High-K dielectrics, oxide, reliability, Silicon, SiO2-films
Issue
5
Pagination
H529-H535
Publication Language
English
Publisher
ELECTROCHEMICAL SOC INC, 65 SOUTH MAIN STREET, PENNINGTON, NJ 08534 USA
Journal
journal of the Electrochemical Society
Start Page
H529
URL
http://apps.webofknowledge.com/full_record.do?product=UA&search_mode=GeneralSearch&qid=1&SID=Q2ethSZrxXonm2Oqivg&page=1&doc=4
Volume
159
Year of Publication
2012