Authors M. Nafría, X. Aymerich, i J. Suñé Citation Key 278 COinS Data Date Published 1996 Issue 7/8 Pagination 871-905 Journal Microelectronics and Reliability Volume 36 Year of Publication 1996 ← Hydrogen desorption in SiGe films: a diffusion limited process → Degradation and breakdown of thin silicon dioxide films under dynamic electrical stress