Authors M. Nafría, X. Aymerich, J. Suñé, i D. Yélamos Citation Key 281 COinS Data Date Published 1995 Pagination 257-261 Journal Quality & Reliability Engineering International Volume 11 Year of Publication 1995 ← High field dynamic stress of thin SiO2 films → Relation between degradation and breakdown of thin SiO2 films under AC stress conditions