Authors M. Nafría, X. Aymerich, i J. Suñé Citation Key 284 COinS Data Date Published 1993 Pagination 333-336 Journal Quality & Reliability Engineering International Volume 9 Year of Publication 1993 ← Exploratory observations of post-breakdown conduction in polycrystalline-Silicon and metal-gated thin-oxide metal-oxide-semiconductor capacitors → Characterization of SiO2 dielectric breakdown for reliability simulation