Authors M. Porti, B. Ebersberger, A. Olbrich, X. Aymerich, i M. Nafría Citation Key 245 COinS Data Date Published 2002 Pagination 388-391 Journal Nanotechnology Volume 13 Year of Publication 2002 ← Electrical characterization of stressed and broken down SiO2 films at a nanometer scale using a Conductive Atomic Force Microscope → Breakdown-induced negative charge in ultrathin SiO2 films measured by atomic force microscopy