Authors M. Nafría, X. Aymerich, J. Suñé, i D. Yélamos Citation Key 282 COinS Data Date Published 1995 Pagination 321-324 Journal Microelectronic Engineering Volume 28 Year of Publication 1995 ← Frequency dependence of degradation and breakdown of thin SiO2 films → Exploratory observations of post-breakdown conduction in polycrystalline-Silicon and metal-gated thin-oxide metal-oxide-semiconductor capacitors