Authors E. Miranda, X. Aymerich, M. Nafría, R. Rodríguez, y J. Suñé Citation Key 269 COinS Data Date Published 1999 Pagination 171-174 Journal Microelectronic Engineering Volume 48 Year of Publication 1999 ← Detection and fitting of the soft breakdown failure mode in MOS structures → A new approach to analyze the degradation and breakdown of thin SiO2 films under static and dynamic electrical stress