Authors
V. Iglesias, G. Bersuker, T. Schroeder, P. Dudek, X. Aymerich, M. Nafría, y M. Porti
Citation Key
155
COinS Data

DOI
10.1063/1.3533257
ISSN
0003-6951
Keywords
Atomic force microscopy, crystallisation, electrical breakdown, electrical conductivity, Grain boundaries, Hafnium compounds, high-k dielectric thin films
Issue
26
Pagination
262906-262906-3
Journal
APPLIED PHYSICS LETTERS
Start Page
262906
URL
http://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=5680522&queryText%3DCorrelation+between+the+nanoscale+electrical+and+morphological+properties+of+crystallized+hafnium+oxide-based+metal+oxide+semiconductor+structures
Volume
97
Year of Publication
2010