Authors M. Porti, X. Aymerich, M. Nafría, y X. Blasco Citation Key 240 COinS Data Date Published 2003 Pagination 584-587 Journal Nanotechnology Volume 14 Year of Publication 2003 ← Current limited stresses of SiO2 gate oxides with Conductive Atomic Force Microscope → Pre-Breakdown noise in electrically stressed thin SiO2 layers of MOS devices observed with C-AFM