Authors
G. Bersuker, M. Nafría, M. Porti, V. Iglesias, A. Shluger, K. McKenna, L. Larcher, A. Padovani, L. Vandelli, P. Kirsch, D. Veksler, y D. C. Gilmer
Citation Key
375
COinS Data

Date Published
Dicember 2011
DOI
10.1063/1.3671565
ISSN
0021-8979
Keywords
AFM, Atomic force microscopy, electric Breakdown, electrical resistivity, grain boundary segregation, Hafnium compounds, leakage currents, oxidation, phonon-phonon interactions, random-acces storage, reliability, stress, titanium compounds, tunnelling, va
Issue
12
Pagination
124518 - 124518-12
Journal
Journal of Applied Physics
Start Page
124518
URL
http://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6119174&sortType%3Ddesc_p_Publication_Year%26pageNumber%3D2%26queryText%3DV.+Iglesias
Volume
110
Year of Publication
2011