Authors R. Rodríguez, X. Aymerich, J. Suñé, E. Miranda, y M. Nafría Citation Key 271 COinS Data Date Published 1999 Pagination 891-895 Journal Microelectronics & Reliability Volume 39 Year of Publication 1999 ← A new approach to analyze the degradation and breakdown of thin SiO2 films under static and dynamic electrical stress → Soft breakdown fluctuation events in ultra-thin SiO2 layers