Authors R. Rodríguez, X. Aymerich, M. Nafría, J. Suñé, R. Pau, y E. Miranda Citation Key 262 COinS Data Date Published 2000 Pagination 251-253 Journal IEEE Electron Device Letters Volume 21(5) Year of Publication 2000 ← Relation between defect generation, SILC and soft-breakdown in thin (< 5nm) oxides → Analysis of the degradation and breakdown of thin SiO2 films under static and dynamic tests using a two-step stress procedure