Authors F. Crupi, R. Rodríguez, M.Nafría, M. Lanuzza, P. Falbo, y L. Magnelli Citation Key 216 COinS Data Date Published 2007 Pagination 1947-1950 Journal Microelectronic Engineering Volume 84(9-10) Year of Publication 2007 ← Influence of the manufacturing process on the electrical properties of thin (< 4nm) Hafnium based high-k stacks observed with CAFM → FinFET and MOSFET preliminary comparison of gate oxide reliability