Authors
V. Iglesias, A. Cordes, G. Bersuker, N. Domingo, E. Miranda, M. Nafría, S. Claramunt, Q. Wu, C. Couso, y M. Porti
Citation Key
392
COinS Data

Date Published
April 2015
DOI
10.1109/IRPS.2015.7112788
ISBN Number
15180560
Keywords
CAFM, conductive atomic force microscopy, device electrical characteristics, electrical conduction analysis, high mobility substrates, III-V semiconductors, lattice mismatch, PF emission process, Poole-Frenkel emission process, post-electrically stressed
Conference Location
Monterey, CA
Publisher
IEEE
Conference Name
International Reliability Physics Symposium (IRPS)
URL
http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7112788&queryText=nafria&sortType=desc_p_Publication_Year&searchField=Search_All
Year of Publication
2015